cHEMICAL vAPOUR dEPOSITION (cvd) FOR tmd
Chemical Vapour Deposition (CVD) has become an increasingly popular technique to grow out Transition Metal Dichalcogenides (TMD) on a large scale and in many different methods. Temperature is an essential factor for reproducing the respective of Transition Metal Dichalcogenides (TMD).
The CVD systems we offers have stable temperature and instruments of the different temperature range to create uniform monolayer films.
The CVD systems we offers have stable temperature and instruments of the different temperature range to create uniform monolayer films.
Smart CVD
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FEATURES
State-of-the-art technology User-friendly; one-click operations Compacted design Highly-integrated work; increase efficiency |
Cold Wall CVD
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FEATURES
Larger area to grow TMDs Consistent surface morphology Automatic Operation Stable process through vapor precursor Wafer-scaled growth area in 6-inch Excellent uniformity for the whole wafer with monolayer film |
Hot Wall CVD
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FEATURES
Larger area to grow TMDs Consistent surface morphology Automatic operation |
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*Pictures shown above are for reference only. Actual product may differ slightly.
**Some products may not be available in all countries. Please contact us for further information and clarification. |
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