Spectroscopic Ellipsometers

UVISEL - Spectroscopic Ellipsometer from FUV to NIR
The UVISEL Spectroscopic Phase Modulated Ellipsometer (SPME) is a unique instrument that incorporates photoelastic device to modulate the polarization without any mechanical movement. Owing to the phase modulation technology the UVISEL spectroscopic ellipsometer performs advanced measurements of the degree of polarization, anisotropy and Mueller Matrix elements.

• High End Research Spectrometer
• Spectroscopic Phase Modulated Ellipsometer
• Highest precision and sensitivity
• Wide spectral range : 190 to 2100 nm
• Fully integrated spectroscopic ellipsometry software package
• Four configurations: Extended Range, VIS, FUV, NIR

MM-16 Spectroscopic Ellipsometer
Spectral range: 430 - 850 nm
The MM-16 is a competitively priced spectroscopic ellipsometer that uses liquid crystal modulators to modulate the polarization without any mechanical movement. This technology provides an ellipsometer that is very fast, very accurate, very compact and very simple to operate.

• A complete turnkey system
• Liquid crystal modulation ellipsometer
• Provides classical ellipsometric data and the full 16-element Mueller Matrix in < 2 seconds in one measurement
• Enhanced application capability for the characterization of depolarizing and anisotropic samples
• Modular Design and competitive price

Laser Ellipsometers

PZ2000 Laser Ellipsometer
The PZ2000 is a cost effective laser ellipsometer that allows accurate characterization of film thickness and optical constants, and is especially suited to transparent films such as oxides, nitrides, high k and low k dielectrics. It delivers the highest performance in terms of accuracy and repeatability. Single layer films can be measured to sub-angstrom precision.

• High precision, cost effective table top laser ellipsometer for research and industrial quality control applications
• 10 µm microspot useful for patterned samples found in semiconductor and biological applications
• Fully upgradeable: up to 3 wavelengths, motorized sample stage, autofocus, pattern recognition, DUV spectroscopic reflectometer
• Cost effective
  

PZ2000 - Combined Laser Ellipsometer and Reflectometer
The PZ2000 has been designed to integrate two thin film measurement technologies - laser ellipsometry and DUV Spectroscopic Reflectometry.

• Integration of two measurement technologies - Laser Ellipsometry and DUV 190 nm Spectroscopic Reflectometry - for research and industrial quality control applications
• 10 µm microspot useful for patterned samples found in semiconductor and biological applications
• Up to 3 wavelengths in the NIR and VIS ranges
• Advanced automation features: precision motorized sample stage, high speed autofocus and robust pattern recognition software

In-Situ Ellipsometers

MM-16 - In-Situ Spectroscopic Ellipsometer
Spectral Range: 430 - 850 nm
Because the MM-16 spectroscopic ellipsometer uses CCD detection, it is very well adapted to in-situ process monitoring and control applications. The MM-16 in-situ spectroscopic ellipsometer ensures accurate real-time calculation of the thickness and optical constants of deposited or etched layers.

• Accurate thickness and optical constants monitoring
• Easy to mount onto a process chamber
• Simple to operate
• Simple integration into the HORIBA Jobin Yvon multi-sensor platform
  

Fully Automated Ellipsometers for Semiconductor Industry

UT-300 - Automatic Spectroscopic Ellipsometer
Spectral range: 190 - 830 nm
The UT-300 - Fully Automatic Spectroscopic Ellipsometer is specially developed to provide specific process control solutions for the semiconductor industry. Equipped with achromatic microspot optics, wafer handling system, autofocus and pattern recognition software the UT-300 provides unique capabilities for analyzing demanding thin film structures at a throughput in excess of 100 wafers/hour. The instrument has a far-UV option (190 nm) and is compatible with 6", 8" and 12" wafers.

• Highest accuracy and precision
• 30 mm achromatic microspot
• DUV 190 nm range
• Advanced automation features
• Designed for advanced thin film characterization

PQ Ruby - Automatic Laser Ellipsometer / Reflectometer
The PQ Ruby tool has been specially designed for in-line process control in IC production. Using a combination of laser ellipsometry and spectroscopic reflectometry the PQ Ruby is capable of determining the thickness, optical refractive index, absorption constants and reflectivity of films up to 30 µm thick, with submonolayer sensitivity. This thin-film metrology tool provides unique advantages in terms of automation, standardization, small footprint and high throughput to suit advanced requirements of mass production.

• Highest precision and long-term stability
• 10 µm spot size for patterned wafers
• Advanced automation features
• Compact clean-room design
• Robust software for production use
  

Large Area Metrology Platforms for Display Industry

FF-1000 - Automatic Spectroscopic Ellipsometer
Spectral range: 190 - 830 nm
The FF-1000 automatic spectroscopic ellipsometer was specifically designed for the display industry and is able to handle up to 5th generation glass substrate. The FF-1000 allows accurate and fast characterization of thickness, optical constants and uniformity for advanced display device applications. It also supports production processes for next generation FPDs such as low-temperature polysilicon in TFT (Thin Film Transistors) and organic EL (Organic Electro Luminescence) processes.

• Highest accuracy for display applications
• Up to 5th flat panel display substrate
• Advanced automation features
• Optional spectroscopic reflectometer
• Integrated software platform

DigiScreen - Spectroscopic Reflectometer Platform
Spectral Range 400 - 800 nm
The DIGISCREEN is an automated Spectroscopic Reflectometer platform ideally suited for R&D and pilot production of flat panel displays. Its unique compact design provides a sample holder almost vertical allowing easier integration and a smaller footprint and is able to handle up to 7th generation substrates.

• Automated UV-VIS spectroscopic reflectometer platform ideally suited for R&D and pilot production of flat panel displays
• Up to 7th generation flat panel display substrates
• Unique vertical design
• Fast film thickness uniformity mapping
• Simple automatic operations